KIMM unveils plasma‑based AI semiconductor process for intelligent 2D chip manufacturing

Researchers at the Korea Institute of Materials and Metals (KIMM) have introduced a new process. The technique combines plasma technology with AI‑enabled semiconductor fabrication. It is designed to produce intelligent systems for two‑dimensional chip manufacturing. The integrated approach aims to improve yield and precision in semiconductor production. KIMM reports that the process can adapt to varying design requirements in real time. Early tests suggest potential reductions in manufacturing cycle time. The development could benefit makers of advanced microelectronics. KIMM plans to collaborate with industry partners to scale the technology.