Assessing whether China can develop an ASML‑equivalent lithography machine

The piece examines China's capacity to produce its own advanced lithography tools. ASML currently dominates the market for extreme‑ultraviolet machines. China seeks to reduce dependence on foreign semiconductor technology. Creating a domestic equivalent would require significant expertise and investment. The article outlines technical and geopolitical hurdles to such a project. It also considers the likely timeline for a homegrown solution. Success could shift the balance of power in chip manufacturing. Observers will watch China's progress in the coming years.